Spectral confocal measurement technology is widely used in industrial measurement due to its advantages of high measurement accuracy, fast measurement speed, and the ability to achieve non-contact measurement. Today, let's first take a look at the origin of spectral confocal technology and its mature typical applications in precision geometric quantity measurement testing.

The concept of confocal microscopy was first proposed by the American Minsky in 1955, who built the first confocal microscope using the confocal principle and applied for a patent in 1957. Since the 1990s, with the rapid development of computer technology, confocal microscopy has become a research hotspot and has developed rapidly. Suzhou Tronsight Intelligent Technology Co., Ltd., relying on Suzhou Institute of Intelligent Manufacturing and in collaboration with Zhejiang University, has developed and refined production over the years. The current推出的TS-C series spectral confocal displacement sensor has broken through several core technologies, with a repeatability of up to 20nm and a linear accuracy of up to ±0.02%, and the highest measurement frequency can reach 160kHz. Customers in need can visit the company's official website (www.tronsight.com) for more details.

Spectral confocal technology has developed from confocal microscopy and does not require axial scanning; it directly correlates wavelength with axial distance information, significantly increasing measurement speed. Sensors based on spectral confocal technology are a new type of high-precision, non-contact sensors that have emerged in recent years, with current precision reaching the nanometer level. Confocal measurement technology has rapidly become a popular sensor in industrial measurement due to its high precision, allowing for larger tilt angles of the measured surface, fast measurement speed, high real-time performance, low requirements for the condition of the measured surface, and its unique advantage of high resolution. It is widely used in fields such as biomedical science, materials science, semiconductor manufacturing, surface engineering research, and precision measurement.